BESSY II
Reflectometer@OpticsBL

The at-Wavelength Metrology Facility /PM1

 

This versatile 11 axes UHV-reflectometer is located at the Optics Beamline, delivering UV and XUV radiation. The soft x-ray bending magnet beamline is equipped with a Plane Grating Monochromator operated in collimated light (collimated PGM). It uses the SX700-1 monochromator equipped with two diffraction gratings 150l/mm for low and 1200 l/mm for high energy ranges. The beamline is optimised for operation with moderate energy resolution but at very high specular purity and efficient stray light reduction provided by a 4-mirror High order suppressor (HIOS), a Filter and Slit Unit (FSU) and additional system of adjustable apertures over the beamline.

The reflectometer is optimized for operation with small test sample as well as for characterisation of real live-sized optical elements. The whole experiment is in a clean-room hutch providing rather safe conditions for testing contamination sensitive optics.

Selected Applications:

  • at-wavelength metrology on XUV optics (diffraction gratings, ML or single coated mirrors, filters and etc.)
  • Soft X-ray/XUV reflectometry (SXR, XRR)

Methods

Surface Diffraction, Elastic Scattering, Reflectivity, NEXAFS, XRF, XMLD, Polarimetry, Reflectometry, XRF

Remote access

depends on experiment - please discuss with Instrument Scientist

 

Film - click on Downloads in box on right side: reflectometer-film.mp4

Film - click on Downloads in box on right side: reflectometer-film.mp4

 

Large sample mount

Large sample mount

Adjustable wafer holder

Adjustable wafer holder

Adjustable rail holder

Adjustable rail holder

LoadLock system hoder (samples up to 60*40*10 mm3 (l*w*h)

LoadLock system hoder (samples up to 60*40*10 mm3 (l*w*h)

The samples are adjustable within six degrees of freedom, and the reflectivity can be measured at all incidence angles for both s- and p- polarisation geometry.

The Reflectometer is equiped by LoadLock system with 5 slots for sample holders. This anables fast in-vacuum change for sampls with sizes in limits of 60mm * 40mm * 10mm (l*w*h).

The setup is primarily dedicated to the in-house R&D in XUV optics and at-wavelength metrology of in-house produced diffraction gratings. It is also available by user-proposals with possibility of a short-term request is specific cases.

contacts
Dr. Franz Schäfers
Dr. Andrey Sokolov
Techniques
Absorption
  • NEXAFS
Diffraction
  • Surface diffraction
Emission or Reflection
  • Polarimetry
  • Reflectrometry
  • X-ray fluorescence (XRF)
Scattering
  • Elastic scattering
  • Reflectivity
control/Data analysis
Control Software Type
  • tbc
Data Output Type
  • tbc
Data Output Format
  • tbc